Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1658 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1685 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1619 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-1678 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-40 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-52 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-70 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-458 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-46 |
filingDate |
2011-05-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62b4e041890f13629be3adae5a493357 |
publicationDate |
2011-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2011203523-A1 |
titleOfInvention |
Method and apparatus for atomic layer deposition |
abstract |
A high pressure processing system including a chamber configured to house a substrate. A fluid introduction system includes at least one composition supply system configured to supply a first composition and a second composition, and at least one fluid supply system configured to supply a fluid. The fluid supply system is configured to alternately and discontinuously introduce the first composition and the second composition to the chamber within the fluid. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9245969-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11189487-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2018063288-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9142562-B2 |
priorityDate |
2004-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |