| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02617
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02573 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0254
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0237
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02458
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02664 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-20 |
| filingDate |
2010-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4288825595098da173179e8f10ea5d2f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7eb213879a3d808876e13769e95d55d7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a0b83f435562d91722ee809f8b5858e4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37d618bbc6c92f791b8336b76e8c27a2 |
| publicationDate |
2011-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2011189837-A1 |
| titleOfInvention |
Realizing N-Face III-Nitride Semiconductors by Nitridation Treatment |
| abstract |
A method of forming a semiconductor structure includes providing a substrate; forming a buffer/nucleation layer over the substrate; forming a group-III nitride (III-nitride) layer over the buffer/nucleation layer; and subjecting the III-nitride layer to a nitridation. The step of forming the III-nitride layer comprises metal organic chemical vapor deposition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015524020-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102169569-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11011676-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2013163323-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012153261-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9396933-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11373995-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20150014470-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9312129-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012309172-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019005031-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8541771-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11545586-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102051026-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20190133304-A |
| priorityDate |
2008-07-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |