http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011168674-A1

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publicationDate 2011-07-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2011168674-A1
titleOfInvention Plasma processing method and apparatus
abstract In atmospheric-pressure plasma processing, fluctuation of a recovery rate or a recovery concentration of a fluorine raw material is restrained to secure stability of processing. n Exhaust gas led out from an atmospheric-pressure plasma processing part 2 to an exhaust line 30 is separated by a separation membrane 41 of a separation part 4 into collected gas for a recovered line 50 and release gas for a release line 60. The collected gas is utilized as at least a part of processing gas. At the time of the separation, physical quantity (preferably pressure) of at least two gases of the collected gas, the release gas and the exhaust gas related to the separation are regulated according to flow rate of the processing gas so that either one or both of a recovery rate or a recovery concentration of a fluorine raw material are as desired.
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