http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011123926-A1
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
filingDate | 2010-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7504b6464847008bffd1808536c8ecb0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0578340d8eda8655050b54e7ae628333 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a144f3526dc1d67cb5c2c69f8714bf36 |
publicationDate | 2011-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-2011123926-A1 |
titleOfInvention | Photoresist composition |
abstract | The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): n n n n n n n n n n wherein R c1 represents an aromatic group which can have one or more substituents, R c2 and R c3 independently each represent a hydrogen atom, an aliphatic hydrocarbon group which can have one or more substituents or an aromatic group which can have one or more substituents, R c4 and R C6 independently each represent a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or R c4 and R c6 are bonded each other to form an alkanediyl group, R c5 represents an aliphatic hydrocarbon group which can have one or more substituents or an amino group which can have one or two substituents, R c7 represents a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or R c5 and R c7 are bonded each other to form an alkanediyl group. |
priorityDate | 2009-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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