| abstract |
An active matrix substrate ( 101 A) comprises a transparent substrate ( 10 ), a wiring formed on the transparent substrate (such as L G , L D , L P , L 1, and L 2 ), a transparent semiconductor layer ( 44 ) that covers at least a part of the wiring, and a transparent insulating film that covers at least a part of the wiring and of the transparent semiconductor layer. The wiring comprises a first metal wiring ( 41 M) serving as a main wiring and a transparent wiring (such as 41, 42, and 43 ) that branches from the main wiring and serves as a sub-wiring. At least a part of the first metal wiring serving as the main wiring is formed by using a material that has a higher conductivity than that of a material for a wiring serving as the sub-wiring. |