| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D317-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C311-48
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D317-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D317-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D319-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D405-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41J2-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C311-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D405-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D319-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D317-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D317-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D317-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2010-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b26f2c695054fbca30f5e6f862db1edb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9b2cbaa9fef0bd8ec66e14cb425cfb01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_986c7afb2116770433e5c3a225913a54 |
| publicationDate |
2011-05-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2011102528-A1 |
| titleOfInvention |
Composition, resist film, pattern forming method, and inkjet recording method |
| abstract |
An embodiment of the composition contains any of compounds of the formula A-LG in which A represents any of residues of general formula (A-1) below and LG represents any of groups that are cleaved to generate acids of the formula A-H when acted on by an acid. The composition further contains at least one of a compound that generates an acid when exposed to actinic rays or radiation and a compound that generates an acid when heated. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9599901-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016327865-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11635688-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9963601-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015024326-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11026298-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019171103-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109071980-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I551943-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103792787-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015014819-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8999623-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014120469-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101927138-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11401251-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017171205-A1 |
| priorityDate |
2009-10-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |