| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2201-052 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1639
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1628
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-1631
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00666
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41J2-16 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2010-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e202f3aa07a42a706d2f59642359670c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_073489e8aa45db09aebcf72fc785e62a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3878fd383202f60f236ce05581a2bc75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea81ad0e2eeeeda1353b6a6a43d28074
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_28f2acc5633ab954cf3aba8b5fe15724 |
| publicationDate |
2011-04-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2011081740-A1 |
| titleOfInvention |
Low Stress Photo-Sensitive Resin with Sponge-Like Structure and Devices Manufactured Employing Same |
| abstract |
System and method for forming a structure including a MEMS device structure. In order to prevent warpage of a substrate arising from curing process for a sacrificial material (such as a photoresist), and from subsequent high temperature process steps, an improved sacrificial material comprises (i) a polymer and (ii) a foaming agent or special function group. The structure can be formed by forming a trench in a substrate and filling the trench with a sacrificial material. The sacrificial material includes (i) a polymer and (ii) a foaming agent or special function group. After further process steps are completed, the sacrificial material is removed from the trench. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/AU-2016221946-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016131657-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-107249892-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014235739-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9708183-B2 |
| priorityDate |
2009-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |