| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eccd894c99fea2d1c0c8735872bb2309 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C18-12 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B1-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-314 |
| filingDate |
2009-03-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_70e3c45cb3bf7154bf486c00d2a138e7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_026cb58490323f3989602718f860a4ed
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73e9da4331b2b9a8acf127710e5ad693
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7be2f0add883e843585436101c1b9528
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3a35e68aaffa950d4979441a575dfd58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_831d9d624dcecffa85daefa48b1ca152 |
| publicationDate |
2011-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2011021037-A1 |
| titleOfInvention |
Composition for manufacturing sio2 resist layers and method of its use |
| abstract |
The present invention relates to compositions, which are useful for the generation of patterned or structured SiO 2 -layers or of SiO 2 -lines during the manufacturing process of semiconductor devices, and which are suitable for the application in inkjet operations. The present invention also relates to a modified process of manufacturing semiconductor devices taking advantage of these new compositions. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016133863-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105793460-A |
| priorityDate |
2008-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |