| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b6c43ce2b3112816cb6acb836188006e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45519
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-507
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4408
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C30B25-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-205
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-448
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C30B25-02 |
| filingDate |
2008-08-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5cfc039995c74a2e34f2323680fd638c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bfaea6ac89401a114ed57605748c1cda |
| publicationDate |
2011-01-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2011017127-A1 |
| titleOfInvention |
Apparatus and method for producing epitaxial layers |
| abstract |
An apparatus and process for plasma enhanced chemical vapor deposition with an inductively coupled plasma with ion densities above 10 10 cm −3 and energies below 20 eV at the substrate enables epitaxial deposition of group IV and compound semiconductor layers at high rates and low substrate temperatures. The epitaxial reactor allows for in-situ plasma cleaning by chlorine and fluorine containing gaseous species. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I720361-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10510545-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012174859-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10640883-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9177787-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10100402-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2019131167-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014256082-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I618152-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013089666-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111212931-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10704140-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10431466-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10720323-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016126090-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014273517-A1 |
| priorityDate |
2007-08-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |