| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0274
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B7-261 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2008-12-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_85a1a530139bc547b3cea219a6113393 |
| publicationDate |
2011-01-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2011003255-A1 |
| titleOfInvention |
Method for processing workpiece with photoresist layer |
| abstract |
A method for processing a workpiece ( 10 ) having a photoresist layer ( 12 ) using an exposure device ( 30 ) is disclosed. A transparent sheet ( 20 ) which allows transmission of light emitted from the exposure device ( 30 ) is disposed between an object lens ( 35 a ) of the exposure device ( 30 ) and the photoresist layer ( 12 ), and the photoresist layer ( 12 ) is exposed to the light through the transparent sheet ( 20 ). |
| priorityDate |
2008-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |