| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ed62b7551998e54b35784cdbbb2778d5 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01F19-08 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32174
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67253
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01F19-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
| filingDate |
2010-06-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a65bd8b18dacb552686eaca28c3a051
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_383b5b21dd54118ed9d39c7c7f9b68cd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c77499bb17a75c6266165e6de69f06b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_17d259e5856a7f1c610b3bde265a97ea
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd13b1a0131b3393734307fce0ad99fa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0c68d462992f4f298092872f5a72eaef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f170ee585711f03b53ab1ee9c7cb966a |
| publicationDate |
2010-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2010323507-A1 |
| titleOfInvention |
Substrate processing apparatus and producing method of device |
| abstract |
A substrate processor enables realization of a proper process by combining advantages of a remote plasma and a plasma generated in an entire processing chamber. The substrate processor includes a conductive member ( 10 ) which is installed surrounding a processing space ( 1 ) and grounded to the earth and a pair of electrodes ( 4 ) installed inside the conductive member ( 10 ). A primary coil of an insulating transformer ( 7 ) is connected to a high-frequency power supply unit ( 14 ) and a secondary coil is connected to the electrodes ( 4 ). A switch ( 13 ) is connected to the connection line connecting the secondary coil to the electrodes ( 4 ). By setting up/cutting off the connection of the line to the earth with use of the switch ( 13 ), the region where the plasma is generated in the processing space ( 1 ) can be changed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010258530-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009071405-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8453600-B2 |
| priorityDate |
2003-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |