| abstract |
A method of using ion implantation techniques to create graphene is disclosed. Carbon ions are implanted in a substrate, such as a metal foil, using a plasma doping system or a beam line implanter. The implant is performed at an elevated temperature, to allow a large number of carbon ions to be absorbed by the foil. As the temperature is reduced, the excessive number of carbon atoms causes the foil to be saturated, and the carbon atoms diffuse to the surface, thereby producing graphene. In another embodiment, a plasma doping system is used, where a plasma containing carbon and other species is created. These additional species are also implanted, thereby causing the diffused atoms to contain both carbon and the additional species. |