| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_26ab2f7383123b56fef8ec0d0235021d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e11546124440b9e9f0446f0354b6ef2d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4bb5dfcac7c3a4341522c8ad539ba97b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2215-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2215-03
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2215-16 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-185
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B11-086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B11-122
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-5873 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B11-12 |
| filingDate |
2010-06-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b18ef7c074dbbce98c70ceac8f3d46a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9da2492035ba580da48e850727f08a75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15f3f1bfa6bf853b3e695fc794f761b9 |
| publicationDate |
2010-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2010313603-A1 |
| titleOfInvention |
Method for manufacturing molding die, method for manufacturing glass gob, and method for manufacturing glass molded article |
| abstract |
This invention provides a method for manufacturing a molding die having excellent durability, with which durability film peeling and air bubbles are effectively reduced. A molding surface having a predetermined shape is formed on a substrate, and a cover layer is deposited on the molding surface by a sputtering method which cover layer is then roughened by etching. In the above method, the cover layer is deposited with the substrate held by a substrate holding member which is rotated around a predetermined rotation axis to vary the relative position between a sputtering target and the substrate holding member in such a way that the angle between the normal line of the surface of the sputtering target and the rotation axis is temporarily varied. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010101276-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8997523-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9388063-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012096900-A1 |
| priorityDate |
2009-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |