| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b051f9f7933c758e66f6ceda5c9fb2cc |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S134-902
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-3021 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2010-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8bd29f9a5caacc17ce6f20d0d82e434c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4418546bd314d2150ca336e6700c2746
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_19f10cab4e06f0ced9460d0c061236d2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd55b668c28f00ca3bc0a6fdc3d1ad87 |
| publicationDate |
2010-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2010304313-A1 |
| titleOfInvention |
Process Solutions Containing Surfactants |
| abstract |
Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce post-development defects such as pattern collapse when employed as a rinse solution either during or after the development of the patterned photoresist layer. Also disclosed is a method for reducing the number of pattern collapse defects on a plurality of photoresist coated substrates employing the process solution of the present invention. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9275851-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8216384-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010175715-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015056822-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9097977-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013116159-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11079677-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8795949-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8748077-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8618002-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2840164-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8987181-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10170297-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014011359-A1 |
| priorityDate |
2002-08-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |