| abstract |
A salt represented by the formula (I-CC): n n n n n n n n n n wherein Q 1 and Q 2 each independently represent a fluorine atom etc., n X 1 represents a single bond etc., n Y 1 represents a C1-C36 aliphatic hydrocarbon group etc., n A 1 and A 2 independently each represents a C1-C20 aliphatic hydrocarbon group etc., n Ar 1 represents a (m 4 +1)-valent C6-C20 aromatic hydrocarbon group which can have one or more substituents, n B 1 represents a single bond etc., n B 2 represents a group capable of being eliminated by the action of an acid, n m 1 and m 2 independently each represents an integer of 0 to 2, m 3 represents an integer of 1 to 3, with the proviso that m 1 plus m 2 plus m 3 equals 3, and m 4 represents an integer of 1 to 3, and a photoresist composition comprising the salt represented by the formula (I-CC) and a resin comprising a structural unit having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid. |