| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_23d31988d706f815fa75dee155b5e700
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_7cbd422f5db6d583b5b18ae953183922
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f5743b4ef7fc0e6971afb089dfda717f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0d6569b8e96a5428b46383726ffa8aa9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c6b7330d6f28560cc4a17fb8aae6dd24 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24479
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-3083 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03B27-72
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03B27-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate |
2010-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d3315c9d91b873133d70e1837979e2da
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14ddb99286196d58a42d1cf9a7eeeaee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fba6a625c1a09b375f2506f27de81229
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_00d906054815f08acd6957316c035189
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab802637827ebe49b000c5e887eaaf93 |
| publicationDate |
2010-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2010297398-A1 |
| titleOfInvention |
Lithography Masks and Methods of Manufacture Thereof |
| abstract |
Lithography masks and methods of manufacture thereof are disclosed. A preferred embodiment comprises a method of manufacturing a lithography mask. The method includes providing a substrate, forming a first pattern in a first region of the substrate, and forming a second pattern in a second region of the substrate, the second pattern comprising patterns for features oriented differently than patterns for features of the first pattern. The method includes affecting a polarization rotation of light differently in the first region than in the second region of the substrate. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2016013521-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014145269-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11264239-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9054021-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I724612-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111458976-A |
| priorityDate |
2006-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |