http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010252413-A1

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filingDate 2009-09-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac8df270e7064629ca078a222c1bd5a7
publicationDate 2010-10-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2010252413-A1
titleOfInvention Apparatus and Method of Manufacturing Polysilicon
abstract An apparatus and method of manufacturing polysilicon is disclosed, which is capable of shortening a time period required for manufacturing polysilicon by depositing polysilicon grains through a pyrolysis of silane gas by using laser beam, and is capable of manufacturing an ingot by directly depositing polysilicon grains and melting the polysilicon grains without using an additional crystal seed, wherein the apparatus comprising a reaction chamber; a gas supplier for supplying a silane gas to the reaction chamber; a laser irradiator for generating polysilicon grains through a pyrolysis of the silane gas by irradiating laser beam to the silane gas supplied from the gas supplier; and a polysilicon-grain receiver for receiving and storing the polysilicon grains.
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