http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010233590-A1

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filingDate 2009-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2010-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2010233590-A1
titleOfInvention Method for Manufacturing Photo Mask Using Fluorescence Layer
abstract A method for fabricating a photo mask using a fluorescence layer, comprising: forming a fluorescence layer on a frame region of a light-transmitting substrate that defines a main cell region and the frame region; forming a phase-shift layer and a light-shielding layer on the light-transmitting substrate and the fluorescence layer; forming a light-shielding main pattern in the main cell region and a light-shielding frame pattern in the frame region by patterning the light-shielding layer; forming a phase-shift main pattern and a phase-shift frame pattern to expose a portion of a surface of the fluorescence layer on side walls thereof, by etching the phase-shift layer using the light-shielding main pattern and the light-shielding frame pattern as an etch mask; irradiating light from a light source on the light-transmitting substrate and detecting an intensity of fluorescence of a fluorescence layer residue emitted from the exposed surface of the fluorescence layer; and determining under-etch or over-etch using the detected fluorescence intensity as a reference fluorescence intensity.
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