http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010233590-A1
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a492183be65153abfa7dec00d51c816 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-54 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-26 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
filingDate | 2009-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_997eb5de8a1c70b51f80c63a727bddc0 |
publicationDate | 2010-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-2010233590-A1 |
titleOfInvention | Method for Manufacturing Photo Mask Using Fluorescence Layer |
abstract | A method for fabricating a photo mask using a fluorescence layer, comprising: forming a fluorescence layer on a frame region of a light-transmitting substrate that defines a main cell region and the frame region; forming a phase-shift layer and a light-shielding layer on the light-transmitting substrate and the fluorescence layer; forming a light-shielding main pattern in the main cell region and a light-shielding frame pattern in the frame region by patterning the light-shielding layer; forming a phase-shift main pattern and a phase-shift frame pattern to expose a portion of a surface of the fluorescence layer on side walls thereof, by etching the phase-shift layer using the light-shielding main pattern and the light-shielding frame pattern as an etch mask; irradiating light from a light source on the light-transmitting substrate and detecting an intensity of fluorescence of a fluorescence layer residue emitted from the exposed surface of the fluorescence layer; and determining under-etch or over-etch using the detected fluorescence intensity as a reference fluorescence intensity. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11260495-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112599707-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I718537-B |
priorityDate | 2009-03-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.