| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_986d0ab29fa7910a46cd21a12d682fe4 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2010-02-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fabe160e0066979124e1325f3a8c29a0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4b147a7232913e5606ef836a34cce043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_007f0ac56ce3c8996ffce38be4931a27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf707d402796dc3699a647e122a18af5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22213c33a9ca66b496c6cc1b105b8be8 |
| publicationDate |
2010-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2010216308-A1 |
| titleOfInvention |
Method for etching 3d structures in a semiconductor substrate, including surface preparation |
| abstract |
A method is provided for producing 3D structures in a semiconductor substrate using Deep Reactive Ion Etching (DRIE), comprising at least the steps of: providing a substrate, and then grinding the backside of the substrate in order to achieve a thinned substrate, wherein extrusions and native oxides are left after said grinding step, and then performing a surface treatment selected from the group consisting of a wet etching step and a dry etching step in order to remove at least said native oxides and extrusions on the surface of said backside of the substrate which are causes for the grass formation during subsequent etching, and then performing deep reactive ion etching in order to achieve 3D vias. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/MD-360-Z
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014227876-A1 |
| priorityDate |
2009-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |