| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0fda0cd9ba2d2bf49854a0d97671a87b |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D07B2205-507
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D07B2205-2071
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D07B2201-1096
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D07B2201-104
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24612 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D07B1-162
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/D07B1-142 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B44C1-22 |
| filingDate |
2006-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14c0f93c7efac965dd35ea22031c5079 |
| publicationDate |
2010-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2010215909-A1 |
| titleOfInvention |
Photomask for the Fabrication of a Dual Damascene Structure and Method for Forming the Same |
| abstract |
A photomask for the fabrication of dual damascene structures and a method for forming the same are provided. A method for fabricating a multilayer step-and-print lithography (SFIL) template includes providing a blank having a substrate, an absorber layer and a first resist layer. A metal layer pattern of a dual damascene structure is formed in the substrate at a first depth using a lithography system. The first resist layer is removed from the blank and a second resist later is applied. The lithography system is used to form a via layer pattern of the dual damascene structure at the first depth while the metal layer pattern is simultaneously etched to a second depth. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9365946-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9581894-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10815582-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014318967-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9122175-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-20170141673-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10156783-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2016172116-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11156914-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9972699-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9972698-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9941389-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104040694-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-102329363-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-104210112-A |
| priorityDate |
2005-09-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |