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publicationDate 2010-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2010207648-A1
titleOfInvention Contact Resistance Test Structure and Method Suitable for Three-Dimensional Integrated Circuits
abstract A contact resistance test structure, a method for fabricating the contact resistance test structure and a method for measuring a contact resistance while using the contact resistance test structure are all predicated upon two parallel conductor lines (or multiples thereof) that are contacted by one perpendicular conductor line absent a via interposed there between. The test structure and related methods are applicable within the context of three-dimensional integrated circuits.
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