http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010187095-A1

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filingDate 2010-01-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2010-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2010187095-A1
titleOfInvention Manufacturing method of a boride film, and manufacturing method of an electron-emitting device
abstract A boride film is deposited on a substrate through an opening portion a shield member located between the substrate and a target by means of a sputtering method. The shield member is arranged so as to shield between an erosion region of the target and the substrate. A distribution of plasma density in a space between the substrate and the target is set in such a manner that a plasma density in a region in which the opening portion is located becomes higher than a plasma density in a region shielded by the shield member.
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Total number of triples: 31.