http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010180634-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5319b21e919f4e08edf22de81d20f6af http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_dd026fa3ded278c032746ca634e8b5cc |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P40-57 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-21 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2201-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B2207-20 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1469 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C03B19-1453 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B20-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C03B19-08 |
| filingDate | 2010-01-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c48f0fd256f1faadeee8a330eca38e2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39267de66ab3576d17923a013fdc0485 |
| publicationDate | 2010-07-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2010180634-A1 |
| titleOfInvention | Method of producing synthetic quartz glass for excimer laser |
| abstract | Disclosed is a method of producing a synthetic quartz glass for excimer laser by depositing on a target silica particulates obtained by subjecting a silica raw material to vapor-phase hydrolysis or oxidative decomposition in an oxyhydrogen flame in a vacuum sintering furnace to form a porous silica base material, vitrifying the porous silica base material, and subjecting the vitrified material to hot forming, an annealing treatment and a hydrogen doping treatment, wherein the vitrification of the porous silica base material includes: (a) a step of holding a vacuum pressure at or below 20.0 Pa in a temperature range from 400° C., inclusive, to 900° C., exclusive; (b) a step of holding a vacuum pressure at or below 10.0 Pa in a temperature range from 900° C., inclusive, to 1100° C., exclusive; and (c) a step of holding a vacuum pressure at or below 3.0 Pa in a temperature range from 1100° C. to a transparent-vitrification temperature. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2684851-A3 |
| priorityDate | 2009-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 36.