http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010133622-A1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd83260a96356882b5f50dd097411a72
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-517
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823857
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-823842
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L27-092
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-8238
filingDate 2009-11-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4a8daab8a4359e2fd31da1fd00719964
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d67b5558be0f9ef0fb0430504591e14
publicationDate 2010-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2010133622-A1
titleOfInvention Semiconductor device including MOSFET with controlled threshold voltage, and manufacturing method of the same
abstract Provided is a semiconductor device including an N-MOSFET and a P-MOSFET on a semiconductor substrate. The N-MOSFET is formed on the semiconductor substrate, and includes a first gate insulating film including a first high-dielectric-constant film having a higher dielectric constant than a silicon oxide film. The P-MOSFET is formed on the semiconductor substrate, and includes a second gate insulating film including a second high-dielectric-constant film having a higher dielectric constant than a silicon oxide film. The first high-dielectric-constant film contains a first metal, and a concentration of the first metal increases from a surface of the first high-dielectric-constant film toward the semiconductor substrate. The second high-dielectric-constant film contains a second metal, and a concentration of the second metal decreases from a surface of the second high-dielectric-constant film toward the semiconductor substrate.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109216198-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-112011102606-B4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014361381-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8921947-B1
priorityDate 2008-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007210354-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009014809-A1
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524915
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID15913
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5352426
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426694112
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14767304
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID452260893
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559541
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID60966
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID62687
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419522015
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449266279
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3084099
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453615033
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5461123

Total number of triples: 37.