| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e456115604355e886dfc533d597ce43c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_56fafea7dd01afeda4b03c2b66c89cf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_baf4fba790d830eb21008e5d783628dd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d46e3536276ee05020ba3873f06f4156 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H3-02 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-306
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N30-082 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-332
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B44C1-22 |
| filingDate |
2008-05-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b106bd294724a7d19228681a3ff970d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dd5f3c98012876ecd679f38c4b7de6a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca4fc248ed924a8373de00d0e4d90bc0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca519f56774963b83c36be53faa79a91 |
| publicationDate |
2010-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2010133233-A1 |
| titleOfInvention |
Dry etching method |
| abstract |
A dry etching method by which a substrate can be dry-etched on both sides without a crack is provided. n The dry etching method includes: introducing an etching gas having a fluorocarbon gas and a rare gas into a vacuum chamber; generating plasma in the vacuum chamber having a predetermined pressure; and etching a substrate to be processed adhered on an adhesive surface of a heat-conductive sheet disposed on a substrate table. |
| priorityDate |
2007-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |