Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_3b6df5e735c84eee36bb3542004942ff http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0f7079834b9b25806b5013dd27060d99 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d4cd7e55d5803921a5edc5d703ac036d |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F32-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
filingDate |
2008-06-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d905c70b97c022b388d62708a43e2b5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_20d59138641ae7db6bdc235cf783cc26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3eee41d797a6885be34ff4a8f224c249 |
publicationDate |
2010-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2010124718-A1 |
titleOfInvention |
Polymeric compound, positive resist composition, and method of forming resits pattern |
abstract |
A polymeric compound including a structural unit (a0) represented by the structural unit (a0-1) shown below: n n n n n n n n n n (in the formula (a0-1), R 1 represents a hydrogen atom, a lower alkyl group, or a halogenated lower alkyl group; R 5 represents an alkyl group; R 6 represents a substituent selected from the group consisting of an alkyl group, an alkoxy group, a halogen atom and a halogenated alkyl group; and e represents an integer of 0 to 5). |
priorityDate |
2007-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |