| abstract |
The cooking device of the present invention comprises a base material and a thin film that is formed on a surface of this base material, wherein said thin film contains silicon (Si), zirconium (Zr) and oxygen (O), and is such that when said silicon (Si) and said zirconium (Zr) are respectively converted to silicon oxide (SiO 2 ) and zirconium oxide (ZrO 2 ), the weight percent of said silicon oxide (SiO 2 ) relative to the total amount of said zirconium oxide (ZrO 2 ) and said silicon oxide (SiO 2 ) is 50 weight % or less. |