| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9d16f3cf95ac2d6d53666c474e02b04a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6b5158e75aea51b0189c25a5a82e76fd
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fd8317526535265948196ba60856c843 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-70025 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-16 |
| filingDate |
2007-12-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6461b88e82d47d2f133aa5229c55d0d9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56c8c3578fb11a2c59710f8fd7c802dc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bdd9ffa226018aea19f45247dc8c7ff5 |
| publicationDate |
2010-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2010081087-A1 |
| titleOfInvention |
Composition for formation of antireflection film and pattern formation method using the same |
| abstract |
The present invention provides a composition for forming a top anti-reflection coating having such a low refractive index that it can be suitably used in pattern formation with an ArF excimer laser beam, and further the invention also provides a pattern formation method employing that composition. The top anti-reflection coating composition comprises a particular naphthalene compound, a polymer, and a solvent. The composition is used for forming a top anti-reflection coating provided on a photoresist layer. From the photoresist layer, a pattern can be formed by use of light in 160 to 260 nm. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010279235-A1 |
| priorityDate |
2006-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |