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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-28
filingDate 2008-12-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff68e64bf5122a0cf3e75afa59b1c20c
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publicationDate 2010-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2010080914-A1
titleOfInvention Patterning by stamped metal resist
abstract A method is provided. A first layer is provided over a substrate, the first layer comprising a first material. A patterned second layer is applied over the first layer via stamping. The second layer comprising a second material. The second layer covers a first portion of the first layer, and does not cover a second portion of the first layer. The second portion of the first layer is removed via a subtractive process while the first portion of the first layer is protected from removal by the patterned second layer.
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