Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2731e95721a6ea61aef77c93ff6f152f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d33ad995f0604f6d9710422652d595cc |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24174 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24752 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B44C5-0453 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B7-00 |
filingDate |
2009-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_206a058b894325e51dc4ed1be8d7b384 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1f58b9d97985611a245b52ca76400275 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f8497353915c457b1f221aea60c6ca4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d390b167f32014e4129d5d9b3e16ee3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a1c42b048393dd3bc90f36476a04c52d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9ce6f2233b2eef47fa76afe47289a0c |
publicationDate |
2010-03-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2010075105-A1 |
titleOfInvention |
Film and housing using the film |
abstract |
A film comprises a base layer, a first patterned layer and a second patterned layer. The base layer includes a first surface and a second surface opposite to the first surface. The first patterned layer is laminated with the base layer partially over the first surface of the base layer. The first patterned layer is belt-shaped and includes a plurality of spaced first strip patterns, such that a first interval space is defined between adjacent two first strip pattern. The second patterned layer is laminated with the base layer partially over the second surface of the base layer. The second patterned layer being belt-shaped and includes a plurality of spaced second strip patterns corresponding to the first strip patterns. The second strip patterns are partially overlapped with corresponding first strip patterns and the rest of the second strip patterns are partially overlapped with corresponding first interval spaces. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2019061393-A1 |
priorityDate |
2008-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |