http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010068480-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b141d018863a90212ecacf5aa003e186 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4353e2ce0ee0e2ef3ff0eab4ed5278f7 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24802 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate | 2009-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dacf571835caba3a71b2e7cd5296ec16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f81d06631c95eff9f8a21798d9984119 |
| publicationDate | 2010-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2010068480-A1 |
| titleOfInvention | Negative-working photosensitive resin composition and photosensitive resin plate using the same |
| abstract | A negative-working photosensitive resin composition is disclosed, comprising (A) a film-forming polymer, (B) an unsaturated compound having a radical polymerizable ethylenic double bond, (C) a photopolymerization initiator, and (D) a thermal polymerization inhibitor, wherein the resin composition further contains (E) at least one member selected from compounds represented by following formula (I): n R 1 —X (I) n wherein —X represents —OR 2 , —COOH, —SO 3 H, —CONHR 2 , —COR 2 , —SO 2 NHR 2 , —HNCONHR 2 , or —HNCOOR 2 ; R 1 and R 2 , which may be the same or different, each represents a hydrogen atom, a substituted or unsubstituted, saturated or unsaturated hydrocarbon group, provided that it does not contain a radical polymerizable ethylenic double bond, a substituted or unsubstituted alicyclic hydrocarbon group, a substituted or unsubstituted aromatic hydrocarbon group, or a heterocyclic group; they may have an ether bond in the chain, provided that when —X is —OH, then R 1 represents a group other than a hydrogen atom and an aromatic hydrocarbon group, in a range of 0.001-0.3 wt % based on the weight of the photosensitive resin composition. A photosensitive resin plate using the photosensitive resin composition is also disclosed. By this invention, a negative-working photosensitive resin composition particularly excellent in the reproducibility of the highlight areas and the independent fine lines and having the deep non-printing depth and good resolving properties, and a photosensitive resin plate using the resin composition are provided. |
| priorityDate | 1998-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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