http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010052706-A1

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7
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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1884
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-0392
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01R31-26
filingDate 2009-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1b56eea2fdaf0fa9095c9e91b95d7efb
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publicationDate 2010-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2010052706-A1
titleOfInvention Consistant and quantitative method for tco delamination evaluation
abstract A method and apparatus for manufacturing photovoltaic cells is provided. In one embodiment, a method for evaluating transparent conductive oxide (TCO) delamination from a substrate is provided. The method comprises providing a glass substrate with a TCO film laminated on a first surface of the glass substrate, depositing a metal layer on a second surface of the glass substrate opposite the first surface, heating the substrate while applying a bias to the substrate, cooling the substrate in a humidity controlled environment for a fixed time period, dividing the TCO film into a plurality of electrically insulated channels using a laser scribing process, and measuring a resistance of each of the plurality of electrically insulated channels.
priorityDate 2008-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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