| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b62a061db267544224c10495ee0cd640 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F224-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-01 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F224-00 |
| filingDate |
2007-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12cb92e59896f9b286b949d9d8066939
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_04c634523cab61f5aaf19fd4f194851a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9efb4b31c34fb381ced5746f775a7212
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9867ea0d28e6728bc07abffb86d8f725
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66e3617a5a2f890a42f2a11f95467f52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0900d7f522aeca4e73569ed65620a79a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_199087c3878189793c44a01feb617761
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ea423314b30263a188ac684e6c69145 |
| publicationDate |
2010-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2010048848-A1 |
| titleOfInvention |
Process for producing polymer for semiconductor lithography |
| abstract |
To provide a method for producing a polymer for semiconductor lithography which can attain high uniformity in the polymer from lot to lot. n The method for producing a polymer for semiconductor lithography includes the step (P) of heating a polymerizable monomer and a polymerization initiator in a solvent, to thereby polymerize the monomer, the step (P) having the step of controlling a polymerization pressure by regulating a liquid level in a container (WO) which is disposed between a polymerization tank and the atmospheric air and which provides liquid sealing. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010222526-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9951163-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016347896-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8455596-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-114682182-A |
| priorityDate |
2006-12-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |