| abstract |
Stationary x-ray target assemblies manufactured using a metal deposition process to form one or more metal layers of the target. In particular, the metal deposition process is used to form an x-ray target metal layer and/or a stress buffer zone on an x-ray target substrate. The stress buffer zone improves material properties of the metals and/or the bonding between the x-ray target metal layer and the substrate. Improved bonding between the x-ray target metal layer and the substrate also improves the heat dissipation properties of the stationary x-ray target assembly. |