| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F226-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D125-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F232-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-32 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-10 |
| filingDate |
2007-11-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ccd40bc3530c30e0cb023b3a760a6e30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b173804edfa358238298a8c8e9aa4305
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4bdbfd830f0d3f90ec805038d728041d |
| publicationDate |
2010-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2010022090-A1 |
| titleOfInvention |
Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin |
| abstract |
There is provided a resist underlayer film forming composition for lithography, which in order to prevent a resist pattern from collapsing after development in accordance with the miniaturization of the resist pattern, is applied to multilayer film process by a thin film resist, has a lower dry etching rate than resists and semiconductor substrates, and has a satisfactory etching resistance relative to a substrate to be processed in the processing of the substrate. A resist underlayer film forming composition used in lithography process by a multiplayer film, comprises a polymer containing a unit structure having an aromatic fused ring, a unit structure having a protected carboxyl group or a unit structure having an oxy ring. A method of forming a pattern by use of the resist underlayer film forming composition. A method of manufacturing a semiconductor device by utilizing the method of forming a pattern. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9805943-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9063424-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8822138-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016284559-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11674051-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9372404-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9994685-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11137682-B2 |
| priorityDate |
2006-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |