http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010006417-A1

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f928e803faac3f56351da4f7ec7f56e2
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J19-08
filingDate 2009-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d475846ce8c3ae877ce400f522f4b066
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_91cb847f32a7aef8268ec3bb85a0c74d
publicationDate 2010-01-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2010006417-A1
titleOfInvention Capacitively-coupled electrostatic (cce) probe arrangement for detecting strike step in a plasma processing chamber and methods thereof
abstract A method for identifying a stabilized plasma within a processing chamber of a plasma processing system is provided. The method includes executing a strike step within the processing chamber to generate a plasma. The strike step includes applying a substantially high gas pressure within the processing chamber and maintaining a low radio frequency (RF) power within the processing chamber. The method also includes employing a probe head to collect a set of characteristic parameter measurements during the strike step, the probe head being on a surface of the processing chamber, wherein the surface is within close proximity to a substrate surface. The method further includes comparing the set of characteristic parameter measurements against a pre-defined range. If the set of characteristic parameter measurements is within the pre-defined range, the stabilized plasma exists.
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Total number of triples: 39.