| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5d4ada69388e0a1b68daaf536597c732
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-5435
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B32B27-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-1545 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-1545 |
| filingDate |
2007-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a48f136c38a4982d529b9eed920a1f5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3abbfabcb5eea364b0dc7f9fe3358fbf |
| publicationDate |
2009-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2009312467-A1 |
| titleOfInvention |
Silsesquioxane resin systems with base additives bearing electron-attracting functionalities |
| abstract |
A silsesquioxane-based composition that contains (a) silsesquioxane resins that contain HSiO 3/2 units and RSiO 3/2 units wherein; R is an acid dissociable group, and (b) 7-diethylamino-4-methylcoumarin. The silsesquioxane-based compositions are useful as positive resist compositions in forming patterned features on substrate, particularly useful for multi-layer layer (i.e. bilayer) 193 nm & 157 nm photolithographic applications. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8241707-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011003480-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011003176-A1 |
| priorityDate |
2006-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |