http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009311622-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2007-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_280629aa9cfbeca26303e077267e143f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_381de81b1f3fad7df1c4007aacaa45f8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32a967e31db7360d42b6cde53b403b50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7d0eec37fb082c5a7f689be97b0429e0 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_108d1bb75db5370aede685b3152590f3 |
| publicationDate | 2009-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2009311622-A1 |
| titleOfInvention | Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film |
| abstract | A pattern formation method suitable for forming micro-patterns using electron beams (EB), X-rays, or extreme ultraviolet radiation (EUV) is provided. The method includes the following steps in the following order: (1) a step of forming and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate, (2) a step of irradiating the under-layer film with radiation through a mask to cause an acid to be selectively generated in the exposed area of the under-layer film, (3) a step of forming an upper-layer film which does not contain a radiation-sensitive acid generator, but contains a composition capable of polymerization or crosslinking by the action of an acid, (4) a step of forming a cured film by polymerization or crosslinking selectively in the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has been generated, and (5) a step of removing the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has not been generated. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10663864-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11675269-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018095365-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10280328-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113327842-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10942449-B2 |
| priorityDate | 2006-08-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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