| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2c78d80e9d323ad7c79518c80e0b8d16 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-78 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-6653
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-665 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 |
| filingDate |
2008-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_34f992243be21ab7ec9083ea267748c7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a7cdd7e24b33dcc03ccdefe5538908c8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dfc4f38d0257b1ebe753761a46f062cf
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_21da6c1d38b466302ed325b9fa300fee
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2dd0a230c632a73bea41e32808e3fcde
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_503b31286c7467024466a6d4f4a2998c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5841e12cf78503fcd813c621aef847c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ec74d995b2bbd4c6be72f2d349b2fa0e |
| publicationDate |
2009-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2009289309-A1 |
| titleOfInvention |
Method for reducing silicide defects in integrated circuits |
| abstract |
A method for forming silicide contacts in integrated circuits (ICs) is described. A spacer pull-back etch is performed during the salicidation process to reduce the stress between the spacer and source/drain silicide contact at the spacer undercut. This prevents the propagation of surface defects into the substrate, thereby minimizing the occurrence of silicide pipe defects. The spacer pull-back etch can be performed after a first annealing step to form the silicide contacts. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-103779270-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11036866-B2 |
| priorityDate |
2008-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |