| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_347b5a7147a5d96032eda0149bc9a798
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5e5c121269689cbab9b3a4548b15caf3 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-2001 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-503
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-26 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05H1-24 |
| filingDate |
2009-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_60f7e10c4fee7bae488da4180c69c0a8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd3e3b9e0c91147768592888accfae9c |
| publicationDate |
2009-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2009263593-A1 |
| titleOfInvention |
Method for manufacturing carbon film |
| abstract |
The present invention provides a method for manufacturing a hard carbon film having a high sp3 bond ratio and excellent film quality. In one embodiment of the present invention, CH 3 ions and CH 3 radicals in plasma are irradiated to a substrate at an energy of 10 to 50 eV, thereby forming a carbon film having a ratio of sp3 bonds of 40% or higher. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011195187-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012327567-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9282653-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8715779-B2 |
| priorityDate |
2008-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |