Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_15c58486c13ca9e5e202c2205a71e6da |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-0473 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J10-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D7-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-185 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-0254 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D3-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-00 |
filingDate |
2007-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6f4908e58f2edc034e33aef9366fd8b |
publicationDate |
2009-10-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2009258160-A1 |
titleOfInvention |
Method for producing organic thin film by using film physical property improving process |
abstract |
The object of the present invention is to provide a method for producing an organic thin film which film properties such as heat resistance or durability are improved. It is a method for producing an organic thin film for forming an organic thin film on a substrate surface, comprising at least a step (B) of allowing the substrate to contact with an organic solvent solution comprising a metal surfactant having at least one or more hydrolysable group or hydroxyl group, and a catalyst that can interact with the metal surfactant, wherein the method further comprises after the step (B), a step (E1) of heating the substrate which has been in contact with the organic solvent solution at 100° C. to 150° C.; a step (E2) of immersing the substrate which has been in contact with the organic solvent solution in a warm water of 40° C. or more and less than the boiling point; or a step (E3) of allowing the substrate which has been in contact with the organic solvent solution to contact with a moisture vapor of 60° C. to 150° C. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9919939-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2018373143-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11458214-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113968983-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2016251263-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10947138-B2 |
priorityDate |
2006-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |