| abstract |
Aspects of the invention include methods for depositing silicon on a substrate. In certain embodiments, the methods include exposing a substrate containing silicon to a halogenated silane in a manner sufficient to deposit the silicon on the substrate. In certain embodiments, the method includes providing a substrate, one or more sources of gas, and a reaction vessel that is in fluid communication with the substrate and the one or more sources of gas. In certain embodiments, the substrate is a low or metallurgical grade silicon which may be subjected to a purification process. In certain embodiments, the reaction vessel is a particle bed reaction vessel that includes a moving bed, such as a fluidized bed which contains silicon and the gas includes a halide. |