http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009238985-A1

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filingDate 2008-03-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f7904e07ded1f4c1450e2d53e25486f1
publicationDate 2009-09-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2009238985-A1
titleOfInvention Systems and methods for deposition
abstract A substrate stage system for supporting and cooling a substrate during a deposition process that involves utilizing a target material is disclosed. The substrate stage system may include a substrate seat made of a thermally conductive material. The substrate stage system may also include a sealing unit coupled with the substrate seat. The sealing unit may define a boundary of a space between the substrate and the substrate seat. The substrate seat may include a gas channel for delivering a gas to the space. The sealing unit may seal the space to inhibit the gas from escaping from the space. The substrate seat may receive heat from the substrate through the gas and may dissipate the heat.
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