http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009233231-A1
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20d3042eb4ea7c9afd525aa89373349d |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-1461 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L63-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F290-144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-1494 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F290-064 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G59-186 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F283-10 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate | 2006-01-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4246af10ae7e42976cd9be4d23eaaee5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2225ec9eacb3d5f34de04fe317919220 |
publicationDate | 2009-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | US-2009233231-A1 |
titleOfInvention | Photosensitive resin composition |
abstract | A photosensitive resin composition of the present invention includes an acid group-containing vinyl ester resin and a photopolymerization initiator as essential components, wherein the acid group-containing vinyl ester resin is an acid group-containing vinyl ester resin having a multiple-branched molecular structure obtained by the following steps where a polybasic anhydride (a3) is reacted with an epoxy vinyl ester resin (v1) that is a reaction product of an aromatic epoxy resin (a1) and a radically-polymerizable unsaturated-double bond-containing monocarboxylic acid (a2); a radically-polymerizable unsaturated-double bond-containing monoepoxy compound (a4) is subsequently reacted with an acid group formed by the reaction; and a polybasic anhydride (a3) is subsequently reacted with a secondary hydroxyl group formed by the reaction of the compound (a4) with the acid group, thereby obtaining the acid group-containing vinyl ester resin having a multiple-branched molecular structure; and contains 1.75 to 3.5 radically-polymerizable unsaturated double bonds per aromatic ring in the acid group-containing vinyl ester resin, and the acid groups within a range where the acid value of the acid group-containing vinyl ester resin reaches 30 to 150 mg KOH/g. According to the present invention, a resin composition for a resist ink that simultaneously has ultrahigh sensitivity, excellent developability, and broad heat control range can be provided. |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9045584-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011052925-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011052925-A2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013059251-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113637146-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014135457-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014155558-A1 |
priorityDate | 2005-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
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