http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009226667-A1

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24355
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-73915
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-8404
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D5-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B3-00
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filingDate 2009-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad297babbbc43ba432f7e606a6822d9b
publicationDate 2009-09-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2009226667-A1
titleOfInvention Silicon substrate for magnetic recording and method for manufacturing the same
abstract A Si substrate for a magnetic recording medium having excellent surface flatness without making a processing process and deposition process of a magnetic recording layer complex, as well as a thermal conductivity that is unchanged from a bulk substrate of a single crystal and a polycrystal is provided. A metal film is deposited (S 7 ) on a polycrystalline silicon substrate after rough polishing (S 6 ) and silicidated or silicon-alloyed (S 8 ). Thereafter, the film is subjected to precision polishing (S 9 ) such as CMP polishing to increase the flatness of the substrate. Accordingly, the Si substrate for a magnetic recording medium can obtain a flat and smooth surface without being influenced by a difference between crystal orientations of the polycrystalline grains and the presence of crystal grain boundary, and can obtain heat resistance and a thermal conductivity approximately equivalent to a bulk Si substrate.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013136952-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10759332-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8951652-B2
priorityDate 2008-03-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 22.