| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_682e4c637b7f79fe32bf84d01f977d99
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ffc9b51485648c29ed2bd59e2fdc338b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_65ba1b7696001b44f4da5a24acc61fba
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_da0dcc0e241d842d18e5ae2861aaa99c |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76224 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-76 |
| filingDate |
2008-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e10b912102bb9de57c30c030a1b1ecc9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ae6ed1dc077d7fe2f43a3652fee214a7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_131b76b855c5aa24182e61dd6ca2c702
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02579949c58c6be0f040bf5e46ed40f6 |
| publicationDate |
2009-08-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2009209083-A1 |
| titleOfInvention |
Hybrid Gap-fill Approach for STI Formation |
| abstract |
A method of forming a shallow trench isolation region is provided. The method includes providing a semiconductor substrate comprising a top surface; forming an opening extending from the top surface into the semiconductor substrate; performing a conformal deposition method to fill a dielectric material into the opening; performing a first treatment on the dielectric material, wherein the first treatment provides an energy high enough for breaking bonds in the dielectric material; and performing a steam anneal on the dielectric material. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102017114427-B4
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/DE-102017114427-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9368386-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10283414-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013288452-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9905642-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11037835-B2 |
| priorityDate |
2008-02-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |