| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_294881271413951a95f284b588a68e66 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2201-0271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T29-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H2003-021 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N30-01
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-173
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00476
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N30-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H03H9-02149 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H03H3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H03H9-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00 |
| filingDate |
2006-01-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c1f5b085758d5cc00f02c2da088a929e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8d8d073cd8be7d548f80cf5198d47959 |
| publicationDate |
2009-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2009200899-A1 |
| titleOfInvention |
Method of manufacturing micromachine, and micromachine |
| abstract |
A method of manufacturing a micromachine in which corrosion of a structure is restrained and the micromachine are provided. The method of manufacturing a micromachine includes a first step of patterningly forming a sacrificial layer 12 having a silicon oxide based material containing a hydrogen fluoride dissociating species on a substrate 11 , a second step of forming a structure 16 on the substrate 11 in the state of covering the sacrificial layer 12 , a third step of forming the structure 16 on the sacrificial layer 12 with a hole part or parts 18 reaching the sacrificial layer 12 , and a fourth step of forming a vibrating space between the substrate 11 and the structure 16 by introducing only a hydrogen fluoride gas or only the hydrogen fluoride gas and an inert gas through the hole part or parts 18 and etching the sacrificial layer 12 by use of the dissociating species contained in the sacrificial layer 12 . The micromachine is manufactured by the method. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010019866-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8450906-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113346864-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10903817-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2012200199-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8723623-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-108233888-A |
| priorityDate |
2005-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |