Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a7d652555853327305a8dc6b5dcbe533 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_339fadd21fc3a91e8c4c6c7bb3dc2628 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_94d5458ce5f31cc91b49b995fa1b0a0e |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-122 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
filingDate |
2009-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e36ba799c482dc7032467c9285ef9bdc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39a3d99ba3e7980430084a6dc643655a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f5d2afd78ebb0712a8f3f346ebe517f0 |
publicationDate |
2009-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2009186296-A1 |
titleOfInvention |
Positive resist compositions and patterning process |
abstract |
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units, represented by formula (1). The acid generator (B) is a specific sulfonium salt compound. When processed by lithography, the composition is improved in resolution and forms a pattern with a satisfactory mask fidelity and a minimal LER. n n n n n n n n n n Herein R 1 is H or methyl, m is 1 or 2, and n is 1 or 2. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010143843-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113185437-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2013183624-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8889335-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8283102-B2 |
priorityDate |
2008-01-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |