http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009181331-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-425 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
| filingDate | 2009-01-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5cafe530b39ade0b556d7cb4fada9a11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_de976579a23d849e29860602eee00f42 |
| publicationDate | 2009-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2009181331-A1 |
| titleOfInvention | Method for forming film pattern |
| abstract | A method for forming a film pattern includes applying a water-soluble photosensitive resin on a substrate, exposing the photosensitive resin to light, developing the photosensitive resin with a developer, after developing the photosensitive resin, depositing a material for the film pattern on the substrate, and, after depositing the material for the film pattern, removing photosensitive resin remaining on the substrate with a remover. The remover and the developer include the same solute, and a concentration of the solute in the remover is higher than that in the developer. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9224631-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9104106-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015024327-A1 |
| priorityDate | 2008-01-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.