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filingDate 2006-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_557eda272d6263ef54a669a9df0c36e6
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publicationDate 2009-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2009152686-A1
titleOfInvention Film Forming Method for Dielectric Film
abstract The present invention is a film forming method for an SiOCH film, comprising a unit-film-forming step including: a deposition step of depositing an SiOCH film element by using an organic silicon compound as a raw material and by using a plasma CVD method; and a hydrogen plasma processing step of providing a hydrogen plasma process to the deposited SiOCH film element, wherein the unit-film-forming step is repeated several times so as to form an SiOCH film on a substrate.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8742587-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014138830-A1
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